Indium Tin Oxide (ITO) Sputtering Target

Indium tin oxide (ITO) in sputtering target form is a doped tin oxide used for depositing transparent conductive films in electronics. It qualifies under HTS 2825.90.20.00 as a tin oxide compound, chemically defined per Chapter 28 notes.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
πŸ‡¨πŸ‡³China4.2%+10.0%14.2%
πŸ‡²πŸ‡½Mexico4.2%+10.0%14.2%
πŸ‡¨πŸ‡¦Canada4.2%+10.0%14.2%
πŸ‡©πŸ‡ͺGermany4.2%+10.0%14.2%
πŸ‡―πŸ‡΅Japan4.2%+10.0%14.2%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

2846.90.80Lower: 3.7% vs 14.2%

If primarily indium compounds with minor tin

Rare-earth compound headings apply if indium predominates over tin oxide.

3818.00.00Higher: 50% vs 14.2%

If doped and cut into wafers/discs

Doped semiconductors in disc form shift to 3818 per Chapter note on electronic materials.

8547.10Lower: 13% vs 14.2%

If assembled into insulating fittings

Finished electrical insulators incorporating ITO classify under Chapter 85.

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Import Tips & Compliance

β€’ Provide detailed alloy composition (% In2O3 vs SnO2) to distinguish from pure indium compounds

β€’ ITAR/EAR export controls may apply; check Commerce Control List for dual-use tech

β€’ Avoid reclassification by ensuring targets are unworked forms, not fabricated parts