Indium Tin Oxide (ITO) Sputtering Target from Japan
Indium tin oxide (ITO) in sputtering target form is a doped tin oxide used for depositing transparent conductive films in electronics. It qualifies under HTS 2825.90.20.00 as a tin oxide compound, chemically defined per Chapter 28 notes.
Duty Rate — Japan → United States
4.2%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Provide detailed alloy composition (% In2O3 vs SnO2) to distinguish from pure indium compounds
• ITAR/EAR export controls may apply; check Commerce Control List for dual-use tech
• Avoid reclassification by ensuring targets are unworked forms, not fabricated parts