KLA-Tencor 29xx Series Reticle Inspection System
The KLA-Tencor 29xx Series is an advanced optical inspection system designed specifically for detecting defects on photomasks and reticles used in semiconductor photolithography. It employs laser scanning and AI-driven pattern recognition to identify patterns and anomalies with high sensitivity. This system falls under tariff item 9031.41.00 as an optical instrument for inspecting photomasks and reticles in semiconductor manufacturing.
Import Duty Rates by Country of Origin
| Origin Country | MFN Tariff | Surtaxes | Total Effective Rate |
|---|---|---|---|
| 🇨🇳China | Free | — | Free |
| 🇲🇽Mexico | Free | — | Free |
| 🇺🇸United States | Free | — | Free |
| 🇩🇪Germany | Free | — | Free |
| 🇯🇵Japan | Free | — | Free |
More Specific Codes
This product may fall under a more specific subheading:
Alternative Classifications
This product could be classified differently depending on its characteristics or intended use.
If the inspection system is used for other optical devices beyond semiconductor reticles
This alternative covers other optical inspection instruments, which may apply if the system's capabilities are not limited to semiconductor applications.
If the system is essentially a microscope with automated inspection features
Microscopes are classified under this heading, and if the primary function is microscopic examination, this could be an alternative.
Not sure which classification is right?
The Tariff Assistant works through the GRI rules on your specific product to reach the right tariff item — and can price the duty on it in the same conversation.
Import Tips & Compliance
• Classify this system under 9031.41.00 and be prepared to demonstrate its dedicated function for photomask and reticle inspection
• The CBSA may require a letter from the manufacturer confirming the system's intended use
• If the system includes proprietary software for pattern recognition, ensure its value is included in the declared transaction value
Related Products under Tariff item 9031.41.00
3D NAND Wafer Structure Inspector
A 3D NAND wafer structure inspector is a specialized optical scatterometry system that measures 3D NAND flash memory structures on semiconductor wafers. It analyzes complex stacked layer dimensions critical for advanced memory device manufacturing. This product is classified under tariff item 9031.41.00 as an optical inspection instrument for semiconductor wafers.
Advanced Packaging Wafer Inspector
An advanced packaging wafer inspector is an optical inspection system designed for fan-out wafer-level packaging (FOWLP) semiconductor wafers. It checks redistribution layers and underfill voids, making it essential for heterogeneous integration in advanced semiconductor packaging. This product is classified under tariff item 9031.41.00 as an optical inspection instrument for semiconductor wafers.
Applied Materials UVision 4E Patterned Wafer Inspector
A high-resolution patterned wafer inspection tool using deep ultraviolet (DUV) optics to detect systematic and random defects on production semiconductor wafers. Essential for yield enhancement in advanced semiconductor nodes below 10nm, this system falls under tariff item 9031.41.00 as it is specifically designed for inspecting semiconductor wafers or devices.
Applied Materials Verifier Summit Reticle Inspector
A high-throughput reticle inspection platform using deep ultraviolet (DUV) illumination for detecting critical defects on advanced node photomasks. Features programmable defect classification and recipe-based inspection, and is classified under 9031.41.00 as it inspects photomasks or reticles.
ASML YieldStar Optical Metrology Tool
An overlay and focus metrology system for semiconductor wafers using diffraction-based optical measurements to ensure lithographic pattern accuracy. Used post-exposure to monitor process control in high-volume manufacturing, this tool is classified under 9031.41.00 as it inspects semiconductor wafers or devices.
Automated Wafer Particle Counter
This automated wafer particle counter is a dark-field optical microscope system that automatically counts and sizes contamination particles on unpatterned semiconductor wafers. It is critical for yield optimization in wafer fabrication cleanrooms. This product falls under tariff item 9031.41.00 as an optical instrument for inspecting semiconductor wafers.