JEOL JSX-5000SPG Electron Beam Pattern Generator from Japan
JEOL's JSX-5000SPG integrates electron beam metrology with precision reticle and wafer stage positioning systems for photomask manufacturing. Falls under HTS 9031.80.40.00 for its semiconductor-specific handling equipment enabling sub-10nm measurements. Used in mask shops for advanced patterning verification.
Duty Rate — Japan → United States
0%
Rate breakdown
9903.05.860%Universal product exemption (U.S. note 52(b))
Import Tips
• Document laser interferometer stage precision (<1nm resolution)
• Include photomask qualification protocols per ITRS roadmap
• Common issue: vibration isolation specs must match fab floor requirements