JEOL JSX-5000SPG Electron Beam Pattern Generator from China
JEOL's JSX-5000SPG integrates electron beam metrology with precision reticle and wafer stage positioning systems for photomask manufacturing. Falls under HTS 9031.80.40.00 for its semiconductor-specific handling equipment enabling sub-10nm measurements. Used in mask shops for advanced patterning verification.
Duty Rate — China → United States
35%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Import Tips
• Document laser interferometer stage precision (<1nm resolution)
• Include photomask qualification protocols per ITRS roadmap
• Common issue: vibration isolation specs must match fab floor requirements