Reticles Defect Scanner from China
High-precision scanner for inspecting reticle defects in extreme ultraviolet (EUV) lithography masks used in advanced semiconductor nodes. Utilizes UV light and AI algorithms for sub-10nm defect detection. Covered by HTS 9031.49.70.00 as equipment for inspecting masks in semiconductor manufacturing.
Duty Rate — China → United States
35%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Import Tips
• Submit detailed resolution specifications (e.g
• 1nm pixel size) and software version details for accurate HTS verification
• Ensure export licenses from origin country if containing controlled optics technology
• Label as 'semiconductor mask inspection only' to distinguish from general-purpose scanners