For inspecting masks (other than photomasks) used in manufacturing semiconductor devices; for measuring surface particulate contamination on semiconductor devices
Measuring or checking instruments, appliances and machines, not specified or included elsewhere in this chapter; profile projectors; parts and accessories thereof: > Other optical instruments and appliances: > Other: > For inspecting masks (other than photomasks) used in manufacturing semiconductor devices; for measuring surface particulate contamination on semiconductor devices
Duty Rate (from China)
Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Products classified under HTS 9031.49.70.00
DUV Mask Metrology Station
Deep ultraviolet metrology station for measuring chrome patterns, quartz thickness, and defectivity on DUV photomasks used in semiconductor fabs. Automated for high-volume inspection. HTS 9031.49.70.00 for semiconductor mask inspection.
Semiconductor Mask Inspection System
An optical inspection system designed specifically for detecting defects in photomasks and reticles used in semiconductor photolithography processes. It employs high-resolution imaging and automated analysis to ensure mask quality before wafer patterning. Classified under HTS 9031.49.70.00 due to its specialized function for inspecting semiconductor manufacturing masks.
Wafer Surface Particle Counter
A laser-based airborne and surface particle measurement tool for quantifying particulate contamination on semiconductor wafers during fabrication. It scans surfaces to detect particles as small as 10nm, ensuring cleanliness standards. Falls under HTS 9031.49.70.00 for its role in measuring surface particulate contamination on semiconductor devices.
Reticles Defect Scanner
High-precision scanner for inspecting reticle defects in extreme ultraviolet (EUV) lithography masks used in advanced semiconductor nodes. Utilizes UV light and AI algorithms for sub-10nm defect detection. Covered by HTS 9031.49.70.00 as equipment for inspecting masks in semiconductor manufacturing.
Photomask Pattern Analyzer
Automated analyzer that measures critical dimensions and overlay accuracy on photomasks for semiconductor production. It uses interferometry to verify pattern fidelity against design data. HTS 9031.49.70.00 applies for mask inspection in semiconductor device manufacturing.
Semiconductor Wafer Cleanliness Tester
Optical tester for non-destructive measurement of surface particulate and organic contamination on bare silicon wafers. Employs dark-field microscopy for real-time cleanroom monitoring. Qualifies under HTS 9031.49.70.00 for measuring surface particulate contamination on semiconductor devices.
EUV Mask Inspector
Specialized inspector for extreme ultraviolet lithography masks, detecting phase defects and absorber irregularities critical for 5nm+ semiconductor nodes. Features actinic wavelength imaging. HTS 9031.49.70.00 for semiconductor mask inspection equipment.
Laser Particle Surface Profiler
Laser scanning profiler measuring topography and particulate distribution on semiconductor device surfaces post-processing. Provides 3D contamination maps for yield analysis. Under HTS 9031.49.70.00 for semiconductor surface particulate measurement.
Reticle Qualification Tool
Tool for comprehensive qualification testing of binary and phase-shift masks, including blank inspection and pattern verification for semiconductor production. Integrates multiple optical modules. HTS 9031.49.70.00 covers mask inspection systems.
Nanoparticle Deposition Monitor
Monitor detecting nanoparticle deposition and surface contamination on semiconductor wafers using condensation particle counting technology. Critical for advanced node yield control. Classified in HTS 9031.49.70.00 for semiconductor particulate measurement.