Reticles Defect Scanner from Canada
High-precision scanner for inspecting reticle defects in extreme ultraviolet (EUV) lithography masks used in advanced semiconductor nodes. Utilizes UV light and AI algorithms for sub-10nm defect detection. Covered by HTS 9031.49.70.00 as equipment for inspecting masks in semiconductor manufacturing.
Duty Rate — Canada → United States
0%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Submit detailed resolution specifications (e.g
• 1nm pixel size) and software version details for accurate HTS verification
• Ensure export licenses from origin country if containing controlled optics technology
• Label as 'semiconductor mask inspection only' to distinguish from general-purpose scanners