DUV Mask Metrology Station from Japan
Deep ultraviolet metrology station for measuring chrome patterns, quartz thickness, and defectivity on DUV photomasks used in semiconductor fabs. Automated for high-volume inspection. HTS 9031.49.70.00 for semiconductor mask inspection.
Duty Rate — Japan → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Include DUV wavelength specs (193nm, 248nm) and throughput (masks/hour)
• Separate handling robotics if not integral to avoid heading 8428
• End-user verification for fab-only deployment