9031.49.70.00/DUV Mask Metrology Station/China

DUV Mask Metrology Station from China

Deep ultraviolet metrology station for measuring chrome patterns, quartz thickness, and defectivity on DUV photomasks used in semiconductor fabs. Automated for high-volume inspection. HTS 9031.49.70.00 for semiconductor mask inspection.

Duty Rate — China → United States

25%

Rate breakdown

9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]

9903.05.860%Universal product exemption (U.S. note 52(b))

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Import Tips

• Include DUV wavelength specs (193nm, 248nm) and throughput (masks/hour)

• Separate handling robotics if not integral to avoid heading 8428

• End-user verification for fab-only deployment