Toray Engineering CIRCL-100 Photomask Inspector from Mexico
Programmable spatial frequency response inspection system for binary and phase-shift photomasks using aerial image simulation technology. Ensures photomask CD uniformity and defect-free patterns for semiconductor production. HTS 9031.41.00 for reticle inspection.
Duty Rate — Mexico → United States
0%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Phase-shift mask (PSM) compatibility specs essential for classification
• Include spatial frequency response curves in technical documentation
• Japanese export control documentation often required for reticle tools