Nova V-R series OCD Metrology Tool from Germany
Optical Critical Dimension (OCD) scatterometry system for semiconductor wafer film thickness and profile measurement using spectroscopic ellipsometry. Non-destructive process control for advanced nodes. HTS 9031.41.00 wafer inspection.
Duty Rate — Germany → United States
0%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Ellipsometry model parameter documentation supports classification
• Reference beam stabilization specs distinguish from general spectrometers
• Israeli dual-use export licensing documentation required