Nova V-R series OCD Metrology Tool from Canada
Optical Critical Dimension (OCD) scatterometry system for semiconductor wafer film thickness and profile measurement using spectroscopic ellipsometry. Non-destructive process control for advanced nodes. HTS 9031.41.00 wafer inspection.
Duty Rate — Canada → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Ellipsometry model parameter documentation supports classification
• Reference beam stabilization specs distinguish from general spectrometers
• Israeli dual-use export licensing documentation required