Lasertec M5650 EUV Blank Inspection System from Japan
Extreme ultraviolet (EUV) blank inspection system using actinic wavelength optics for multilayer defect detection on EUV photomasks. Essential for 3nm and below semiconductor nodes. Specifically HTS 9031.41.00 for photomask inspection.
Duty Rate — Japan → United States
0%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• EUV-specific actinic wavelength documentation critical for classification
• Multilayer pellicle compatibility specs required
• Japanese Wassenaar Arrangement export controls typically apply