Hitachi NSX Series Reticle Inspection System from China
Die-to-database reticle inspection system using transmitted and reflected light optics for photomask defect detection in semiconductor lithography. Critical for ensuring mask quality in leading-edge chip production. Classified in HTS 9031.41.00 for photomask/reticle inspection.
Duty Rate — China → United States
25%
Rate breakdown
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Include die-to-database inspection methodology documentation to distinguish from general optical comparators
• Declare laser class and wavelength specifications required for optical import safety compliance