ASML YieldStar Optical Metrology Tool from Mexico
Overlay and focus metrology system for semiconductor wafers using diffraction-based optical measurements to ensure lithographic pattern accuracy. Used post-exposure to monitor process control in high-volume manufacturing. HTS 9031.41.00 as wafer inspection equipment.
Duty Rate — Mexico → United States
0%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Technical drawings showing optical path and diffraction grating integration required for classification
• Separate valuation of pattern generator software if imported independently