Phase Shift Mask Inspector from Japan
Advanced optical interferometer for inspecting phase shift photomasks used in semiconductor lithography, measuring phase uniformity and defects. Critical for 193nm immersion lithography processes. HTS 9031.41.0060 covers other wafer inspection optical tools.
Duty Rate — Japan → United States
0%
Rate breakdown
9903.05.860%Universal product exemption (U.S. note 52(b))
Import Tips
• Specify phase measurement accuracy (e.g
• 1° phase error detection)
• Document as complete inspection instrument, not photomask handling part
• Include lithography wavelength compatibility for classification support