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Phase Shift Mask Inspector from Germany

Advanced optical interferometer for inspecting phase shift photomasks used in semiconductor lithography, measuring phase uniformity and defects. Critical for 193nm immersion lithography processes. HTS 9031.41.0060 covers other wafer inspection optical tools.

Duty Rate — Germany → United States

0%

Rate breakdown

9903.05.860%Universal product exemption (U.S. note 52(b))

Import Tips

Specify phase measurement accuracy (e.g

1° phase error detection)

Document as complete inspection instrument, not photomask handling part

Include lithography wavelength compatibility for classification support

Phase Shift Mask Inspector from Germany — Import Duty Rate | HTS 9031.41.00.60