9031.41.00.60/Phase Shift Mask Inspector/China

Phase Shift Mask Inspector from China

Advanced optical interferometer for inspecting phase shift photomasks used in semiconductor lithography, measuring phase uniformity and defects. Critical for 193nm immersion lithography processes. HTS 9031.41.0060 covers other wafer inspection optical tools.

Duty Rate — China → United States

25%

Rate breakdown

9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]

9903.05.860%Universal product exemption (U.S. note 52(b))

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Import Tips

• Specify phase measurement accuracy (e.g

• 1° phase error detection)

• Document as complete inspection instrument, not photomask handling part

• Include lithography wavelength compatibility for classification support