EUV Blank Inspection System from Mexico
Extreme ultraviolet optical inspection system for EUV photomask blanks used in cutting-edge semiconductor manufacturing. Detects defects invisible to visible light inspection. Under HTS 9031.41.0060 as other semiconductor wafer inspection optical instrument.
Duty Rate — Mexico → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Specify EUV wavelength (13.5nm) and actinic inspection capability
• Classify as complete system, not photomask coater accessory
• Include export control documentation for advanced semiconductor tech