EUV Blank Inspection System from China
Extreme ultraviolet optical inspection system for EUV photomask blanks used in cutting-edge semiconductor manufacturing. Detects defects invisible to visible light inspection. Under HTS 9031.41.0060 as other semiconductor wafer inspection optical instrument.
Duty Rate — China → United States
25%
Rate breakdown
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Specify EUV wavelength (13.5nm) and actinic inspection capability
• Classify as complete system, not photomask coater accessory
• Include export control documentation for advanced semiconductor tech