EUV Blank Inspection System from Canada
Extreme ultraviolet optical inspection system for EUV photomask blanks used in cutting-edge semiconductor manufacturing. Detects defects invisible to visible light inspection. Under HTS 9031.41.0060 as other semiconductor wafer inspection optical instrument.
Duty Rate — Canada → United States
0%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Specify EUV wavelength (13.5nm) and actinic inspection capability
• Classify as complete system, not photomask coater accessory
• Include export control documentation for advanced semiconductor tech