Critical Dimension SEM Wafer Metrology Tool from China
Optical pre-alignment system for scanning electron microscopes measuring critical dimensions on semiconductor device patterns. Provides optical overlay for nanoscale feature inspection. Under HTS 9031.41.0060 as other wafer/device optical inspector.
Duty Rate — China → United States
25%
Rate breakdown
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Include SEM integration specs but classify as standalone optical instrument
• Avoid machine part description per note (f) to stay in Chapter 90
• Certify for cleanroom Class 1 use to support semiconductor application