Automated Reticle Pattern Checker from Japan
Precision optical system for inspecting photomasks and reticles used in semiconductor lithography, detecting line width variations and contamination. Employs UV light and high-resolution cameras for pattern verification. Falls under HTS 9031.41.0060 for other wafer/device inspection instruments.
Duty Rate — Japan → United States
0%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Provide photomask/reticle-specific calibration data to distinguish from general optical comparators
• Ensure documentation excludes technical use in machines per Chapter 90 note (a) to prevent reclassification
• Label as 'other' wafer inspection to match 9031.41.0060; avoid broad 'optical instrument' descriptions