Automated Reticle Pattern Checker from China
Precision optical system for inspecting photomasks and reticles used in semiconductor lithography, detecting line width variations and contamination. Employs UV light and high-resolution cameras for pattern verification. Falls under HTS 9031.41.0060 for other wafer/device inspection instruments.
Duty Rate — China → United States
25%
Rate breakdown
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Provide photomask/reticle-specific calibration data to distinguish from general optical comparators
• Ensure documentation excludes technical use in machines per Chapter 90 note (a) to prevent reclassification
• Label as 'other' wafer inspection to match 9031.41.0060; avoid broad 'optical instrument' descriptions