Wafer Surface Defect Scanner from China
An optical inspection system designed specifically for detecting microscopic defects on semiconductor wafers during manufacturing. It uses laser scanning and high-resolution imaging to identify particles, scratches, and pattern anomalies on bare silicon wafers. Classified under HTS 9031.41.00.40 as an optical instrument for inspecting semiconductor wafers.
Duty Rate — China → United States
35%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Import Tips
• Verify equipment meets semiconductor cleanroom standards (ISO 14644) and obtain FCC certification for laser components
• Include detailed technical specs and end-user statements proving exclusive use for wafer inspection to avoid reclassification