</>Build with Tariff Intelligence|Programmatic access to tariff calculations and HS code classification.Explore Developer Resources →
9031.41.00.40/Wafer Critical Dimension SEM/Mexico

Wafer Critical Dimension SEM from Mexico

Scanning electron microscope with optical pre-alignment for measuring critical dimensions on semiconductor wafers post-lithography. Though primarily electron beam, includes essential optical wafer handling and positioning. Borderline HTS 9031.41.00.40 for wafer optical components.

Duty Rate — Mexico → United States

10%

Rate breakdown

9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Calculate with your customs valueVerify classification with AI

Import Tips

• Detailed optical vs electron beam functionality breakdown required for customs

• Electron gun and vacuum system components may classify separately under Chapter 85

Wafer Critical Dimension SEM from Mexico — Import Duty Rate | HTS 9031.41.00.40