Oblique Illumination Wafer Inspector from Japan
Specialized optical system using oblique angle illumination to enhance topographic defect visibility on patterned semiconductor wafers. Ideal for detecting shallow pits and mounds. Classified HTS 9031.41.00.40 for wafer optical inspection optimization.
Duty Rate — Japan → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Illumination angle and polarization specifications required for optical review
• Patterned wafer compatibility distinguishes from blank wafer inspectors
• Software algorithms treating as machine vision may risk 8479 classification