Zygo VeriFire XP8 Reticle Phase Measurement System from Mexico
Laser Fizeau interferometer system for measuring phase errors and wavefront aberrations in phase-shift photomasks used for semiconductor lithography. Provides angstrom-level precision for optical proximity correction verification. HTS 9031.41.0020 classification for semiconductor reticle optical inspection.
Duty Rate — Mexico → United States
0%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Document wavelength-specific calibration traceable to NIST standards
• Provide evidence of photomask handling fixtures distinguishing from general interferometers
• Avoid classification as general laboratory optics by specifying semiconductor manufacturing context