Zygo VeriFire XP8 Reticle Phase Measurement System from China
Laser Fizeau interferometer system for measuring phase errors and wavefront aberrations in phase-shift photomasks used for semiconductor lithography. Provides angstrom-level precision for optical proximity correction verification. HTS 9031.41.0020 classification for semiconductor reticle optical inspection.
Duty Rate — China → United States
35%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Import Tips
• Document wavelength-specific calibration traceable to NIST standards
• Provide evidence of photomask handling fixtures distinguishing from general interferometers
• Avoid classification as general laboratory optics by specifying semiconductor manufacturing context