CyberOptics SQ3000 Reticle Dimension Metrology Tool from Japan
Advanced 3D dimension metrology system using structured light for measuring photomask critical dimensions, sidewall angles, and overlay targets. Supports 5nm node requirements for mask qualification. Classified HTS 9031.41.0020 for reticle inspection in semiconductor manufacturing.
Duty Rate — Japan → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Include calibration artifacts traceable to international metrology standards
• Document 24/7 uptime specifications typical for fab tools
• Avoid mechanical gauge classification by emphasizing non-contact optical method