Applied Materials Verifier Summit Reticle Inspector from Japan
High-throughput reticle inspection platform using deep ultraviolet (DUV) illumination for detecting critical defects on advanced node photomasks. Features programmable defect classification and recipe-based inspection tailored for EUV and DUV lithography reticles. Falls under HTS 9031.41.0020 as a specialized optical appliance for semiconductor reticle quality control.
Duty Rate — Japan → United States
0%
Rate breakdown
9903.05.860%Universal product exemption (U.S. note 52(b))
Import Tips
• Submit photomask manufacturing process flow diagrams to customs to substantiate specialized classification
• Ensure cleanroom compatibility documentation and static control certifications for import clearance
• Watch for anti-dumping duties on high-precision optical equipment from certain Asian manufacturers