Applied Materials Verifier Summit Reticle Inspector from China
High-throughput reticle inspection platform using deep ultraviolet (DUV) illumination for detecting critical defects on advanced node photomasks. Features programmable defect classification and recipe-based inspection tailored for EUV and DUV lithography reticles. Falls under HTS 9031.41.0020 as a specialized optical appliance for semiconductor reticle quality control.
Duty Rate — China → United States
35%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Import Tips
• Submit photomask manufacturing process flow diagrams to customs to substantiate specialized classification
• Ensure cleanroom compatibility documentation and static control certifications for import clearance
• Watch for anti-dumping duties on high-precision optical equipment from certain Asian manufacturers