Titanium Sputtering Target for PVD Systems from Japan
A high-purity titanium disc used as the source material in physical vapor deposition (PVD) apparatus for depositing thin titanium films on substrates. It is specifically designed for magnetron sputtering modules within PVD vacuum chambers of subheading 8543.70. Classified under 8543.90.12.00 as a key consumable part essential for the thin-film deposition function of PVD equipment.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Verify material purity certificates (e.g
• 99.99% Ti) to confirm PVD compatibility and avoid reclassification; include end-use statements linking to 8543.70 apparatus; watch for anti-dumping duties on certain metal targets from Asia