Titanium Sputtering Target for PVD Systems from Canada
A high-purity titanium disc used as the source material in physical vapor deposition (PVD) apparatus for depositing thin titanium films on substrates. It is specifically designed for magnetron sputtering modules within PVD vacuum chambers of subheading 8543.70. Classified under 8543.90.12.00 as a key consumable part essential for the thin-film deposition function of PVD equipment.
Duty Rate — Canada → United States
10%
Rate breakdown
9903.05.2910%Section 301 (forced labor) — additional 10% ad valorem on products of Canada
Import Tips
• Verify material purity certificates (e.g
• 99.99% Ti) to confirm PVD compatibility and avoid reclassification; include end-use statements linking to 8543.70 apparatus; watch for anti-dumping duties on certain metal targets from Asia