PVD Substrate Heater Element from Canada
A resistively heated platform that maintains substrate temperatures up to 800°C during PVD film deposition. Designed for integration into physical vapor deposition apparatus of subheading 8543.70. Essential for controlling deposition kinetics in microelectronics fabrication.
Duty Rate — Canada → United States
10%
Rate breakdown
9903.05.2910%Section 301 (forced labor) — additional 10% ad valorem on products of Canada
Import Tips
• Provide temperature uniformity specs and power ratings; ensure thermocouple integration docs; avoid misdeclaration as general heating element to prevent reclassification