PVD Plasma Cleaning Head from Mexico
A RF-powered electrode assembly for pre-deposition substrate cleaning in PVD chambers. Part of physical vapor deposition apparatus in subheading 8543.70, removing contaminants via reactive plasma. Enhances adhesion for high-quality thin films.
Duty Rate — Mexico → United States
10%
Rate breakdown
9903.05.5510%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.94, articles the product of Mexico, as provided for in U.S. note 52 to this subchapter
Import Tips
• RF power and gas flow specs mandatory; ensure electrode material certs (e.g
• aluminum oxide); declare cleaning function tied to deposition process