8543.90.12.00/PVD Plasma Cleaning Head/Japan

PVD Plasma Cleaning Head from Japan

A RF-powered electrode assembly for pre-deposition substrate cleaning in PVD chambers. Part of physical vapor deposition apparatus in subheading 8543.70, removing contaminants via reactive plasma. Enhances adhesion for high-quality thin films.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

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Import Tips

• RF power and gas flow specs mandatory; ensure electrode material certs (e.g

• aluminum oxide); declare cleaning function tied to deposition process