PVD Plasma Cleaning Head from Germany
A RF-powered electrode assembly for pre-deposition substrate cleaning in PVD chambers. Part of physical vapor deposition apparatus in subheading 8543.70, removing contaminants via reactive plasma. Enhances adhesion for high-quality thin films.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.97, articles the product of a member state of the European Union, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 10 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• RF power and gas flow specs mandatory; ensure electrode material certs (e.g
• aluminum oxide); declare cleaning function tied to deposition process