PVD Plasma Cleaning Head from China
A RF-powered electrode assembly for pre-deposition substrate cleaning in PVD chambers. Part of physical vapor deposition apparatus in subheading 8543.70, removing contaminants via reactive plasma. Enhances adhesion for high-quality thin films.
Duty Rate — China → United States
37.5%
Rate breakdown
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
9903.05.3112.5%Section 301 (forced labor) — additional 12.5% ad valorem on products of China
Import Tips
• RF power and gas flow specs mandatory; ensure electrode material certs (e.g
• aluminum oxide); declare cleaning function tied to deposition process