Magnetron Sputtering Cathode Assembly from Mexico
An assembly containing permanent magnets, cooling channels, and mounting fixtures for holding sputtering targets in PVD systems. Essential for generating the plasma discharge in physical vapor deposition apparatus under subheading 8543.70. This part enables uniform thin-film deposition in semiconductor and optics manufacturing.
Duty Rate — Mexico → United States
10%
Rate breakdown
9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
Import Tips
• Provide technical drawings showing integration with PVD chamber to justify classification; ensure RoHS compliance for electronic components; declare magnetic field strength to prevent safety rejections at customs