Diener Electronic Nano Plasma Cleaner from Japan
Diener's Nano plasma system cleans sub-micron electron microscopy specimens using low-pressure RF plasma in a compact 1.5L chamber. Designed for high-resolution TEM and SEM holders, it prevents hydrocarbon buildup that causes imaging artifacts. Classified under HTS 8543.70.97.00 for electron microscopy specimen preparation.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Declare chamber volume and pressure range; specify RF matching network details; include nanofabrication facility end-use statement