Diener Electronic Nano Plasma Cleaner from Japan
Diener's Nano plasma system cleans sub-micron electron microscopy specimens using low-pressure RF plasma in a compact 1.5L chamber. Designed for high-resolution TEM and SEM holders, it prevents hydrocarbon buildup that causes imaging artifacts. Classified under HTS 8543.70.97.00 for electron microscopy specimen preparation.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Declare chamber volume and pressure range; specify RF matching network details; include nanofabrication facility end-use statement