Diener Electronic Nano Plasma Cleaner from China
Diener's Nano plasma system cleans sub-micron electron microscopy specimens using low-pressure RF plasma in a compact 1.5L chamber. Designed for high-resolution TEM and SEM holders, it prevents hydrocarbon buildup that causes imaging artifacts. Classified under HTS 8543.70.97.00 for electron microscopy specimen preparation.
Duty Rate — China → United States
37.5%
Rate breakdown
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
9903.05.3112.5%Section 301 (forced labor) — additional 12.5% ad valorem on products of China
Import Tips
• Declare chamber volume and pressure range; specify RF matching network details; include nanofabrication facility end-use statement