Veeco SPECTRO Series PVD System from Japan
Veeco SPECTRO physical vapor deposition apparatus uses ion beam sputtering for precision optical coatings and semiconductor films, featuring automated substrate handling and in-situ monitoring. Designed for high-uniformity deposition over large areas. Classified in 8543.70.20.00 for its electrical thin film deposition function.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Provide ion source specifications and deposition rate data for classification
• Optical coating systems may require additional FDA registration if for medical devices
• Ensure proper hazardous material declarations for spares