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8543.70.20.00/Novellus (Lam Research) SPEED PVD/Mexico

Novellus (Lam Research) SPEED PVD from Mexico

Novellus SPEED physical vapor deposition apparatus uses ionized metal plasma technology for advanced copper interconnect filling in semiconductor devices. Features collimation and resputtering capabilities. Classified under HTS 8543.70.20.00 for PVD.

Duty Rate — Mexico → United States

12.5%

Rate breakdown

9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
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Import Tips

• Document IMP source technology and bottom coverage specs

• Advanced semiconductor tools face strict export controls

• Submit complete process integration requirements

Novellus (Lam Research) SPEED PVD from Mexico — Import Duty Rate | HTS 8543.70.20.00