Novellus (Lam Research) SPEED PVD from Germany
Novellus SPEED physical vapor deposition apparatus uses ionized metal plasma technology for advanced copper interconnect filling in semiconductor devices. Features collimation and resputtering capabilities. Classified under HTS 8543.70.20.00 for PVD.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%
Import Tips
• Document IMP source technology and bottom coverage specs
• Advanced semiconductor tools face strict export controls
• Submit complete process integration requirements