8543.70.20.00/Novellus (Lam Research) SPEED PVD/Canada

Novellus (Lam Research) SPEED PVD from Canada

Novellus SPEED physical vapor deposition apparatus uses ionized metal plasma technology for advanced copper interconnect filling in semiconductor devices. Features collimation and resputtering capabilities. Classified under HTS 8543.70.20.00 for PVD.

Duty Rate — Canada → United States

12.5%

Rate breakdown

9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Calculate with your customs valueVerify classification with AI

Import Tips

• Document IMP source technology and bottom coverage specs

• Advanced semiconductor tools face strict export controls

• Submit complete process integration requirements

Novellus (Lam Research) SPEED PVD from Canada — Import Duty Rate | HTS 8543.70.20.00