8543.70.20.00/CVC Z-400 Sputtering System/Mexico

CVC Z-400 Sputtering System from Mexico

CVC Z-400 planar magnetron physical vapor deposition apparatus for semiconductor metallization layers, featuring cryogenic pumping and substrate preheat stations. Proven platform for aluminum and titanium deposition. HTS 8543.70.20.00 coverage.

Duty Rate — Mexico → United States

12.5%

Rate breakdown

9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
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Import Tips

• Verify cryopump regeneration cycle documentation

• Legacy semiconductor equipment needs material safety updates

• Provide target shielding configuration details

CVC Z-400 Sputtering System from Mexico — Import Duty Rate | HTS 8543.70.20.00