CVC Z-400 Sputtering System from Mexico
CVC Z-400 planar magnetron physical vapor deposition apparatus for semiconductor metallization layers, featuring cryogenic pumping and substrate preheat stations. Proven platform for aluminum and titanium deposition. HTS 8543.70.20.00 coverage.
Duty Rate — Mexico → United States
12.5%
Rate breakdown
9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
Import Tips
• Verify cryopump regeneration cycle documentation
• Legacy semiconductor equipment needs material safety updates
• Provide target shielding configuration details