Via Filling Electrolytic Cell from China
Modular electrolytic cell for copper electrofilling microvias in high-density interconnect (HDI) PCBs. Features precise anode-cathode spacing for blind/buried via metallization. Classified under 8543.30.2000 for electroplating cells dedicated to printed circuit manufacture.
Duty Rate — China → United States
37.5%
Rate breakdown
9903.05.3112.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of China, as provided for in U.S. note 52 to this subchapter
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Import Tips
• Include HDI PCB process specifications demonstrating via diameter/filling requirements
• Document cell modular design for specific panel carrier systems used in circuit production
• Prevent reclassification by excluding general semiconductor plating applications