Reticles Mask Cleaning Station from Japan
Automated wet and megasonic cleaning system designed specifically for cleaning photomasks and reticles without pattern damage. Classified in HTS 8486.40.0010 for mask manufacturing preparation processes.
Duty Rate — Japan → United States
0%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Specify cleaning chemistries and megasonic frequencies optimized for photoresist removal
• Document cleanroom compatibility (Class 1) and throughput specifications