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8486.40.00.10/Reticles Mask Cleaning Station/Japan

Reticles Mask Cleaning Station from Japan

Automated wet and megasonic cleaning system designed specifically for cleaning photomasks and reticles without pattern damage. Classified in HTS 8486.40.0010 for mask manufacturing preparation processes.

Duty Rate — Japan → United States

0%

Rate breakdown

9903.05.860%Universal product exemption (U.S. note 52(b))
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Import Tips

• Specify cleaning chemistries and megasonic frequencies optimized for photoresist removal

• Document cleanroom compatibility (Class 1) and throughput specifications

Reticles Mask Cleaning Station from Japan — Import Duty Rate | HTS 8486.40.00.10